Japan, March 27 -- MITSUBISHI GAS CHEMICAL CO INC has got intellectual property rights for 'METHOD FOR FORMING RESIST UNDERLAYER FILM AND PATTERN FORMING METHOD.' Other related details are as follows:
Application Number: JP,2020-121612
Category (FI): C08G61/10,C08G61/12,G03F7/11,502,G03F7/11,503,G03F7/40,521,H01L21/30,573,H10P76/00,573
Stage: Grant (IP right granted following substantive examination.)
Filing Date: July 15, 2020
Publication Date: Jan. 27, 2022
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication....