Japan, Aug. 6 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'MATERIAL FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, PATTERNING METHOD, AND COMPOUND.' Other related details are as follows:

Application Number: JP,2023-063361

Category (FI): C07C43/29@D,C07C43/20@D,C07C39/17,C07C211/54,G03F7/11,502,G03F7/11,503,G03F7/26,511,C08G8/20@Z

Stage: Grant (IP right granted following substantive examination.)

Filing Date: April 10, 2023

Publication Date: Oct. 23, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

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