Japan Intellectual Property Rights: MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND SUBSTRATE

Japan, July 31 -- FUJITSU LTD has got intellectual property rights for 'MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND SUBSTRATE.' Other related details are as follows:

Application Number: JP,2023-032914

Category (FI): H01L29/91@F,H01L21/205,H01L29/80@C,H01L29/80@H,H10D8/50@C,H01L29/91@C,H10P14/20,H10D8/60@F,H10D8/50@F,H10D30/47,201,H10D30/83,H10D64/64,H10D64/64@B,H10D8/60@D,H01L29/91@A,H01L29/86,301@P,H01L29/86,301@F,H01L29/86,301@D,H10D8/01@S,H10D8/01@A,H01L29/48@D,H10P14/24,H10D30/01,401,H01L21/20

Stage: Grant (IP right granted following substantive examination.)

Filing Date: March 3, 2023

Publication Date: Sept. 13, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Sy...