Japan, March 25 -- TOKYO ELECTRON LTD has got intellectual property rights for 'INSULATING FILM FORMATION METHOD AND SUBSTRATE PROCESSING SYSTEM.' Other related details are as follows:
Application Number: JP,2022-033322
Category (FI): H01L21/316@X,H01L21/318@B,H01L21/31@C,H10P14/60,101@C,H10P14/692@X,H10P14/694@B
Stage: Grant (IP right document published.)
Filing Date: March 4, 2022
Publication Date: Sept. 14, 2023
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication....