Japan, Sept. 7 -- SLT TECHNOLOGIES INC has got intellectual property rights for 'IMPROVED III-NITRIDE SUBSTRATE, METHOD OF MAKING THE SAME, AND METHOD OF USING THE SAME.' Other related details are as follows:

Application Number: JP,2024-214419

Category (FI): H10F39/10@K,H10F39/18@A,H01L21/20,C30B29/38@D,C30B25/04,H10P14/20

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Dec. 9, 2024

Publication Date: April 10, 2025

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....