Japan, Feb. 24 -- CANON TOKKI CORP has got intellectual property rights for 'FILM DEPOSITION APPARATUS.' Other related details are as follows:
Application Number: JP,2021-096485
Category (FI): C23C14/34@C,C23C14/34@A,H10K71/16
Stage: PROBLEM TO BE SOLVED: To provide a technique for more efficiently removing impurities inside a chamber using a getter material in a film deposition apparatus for sputtering.SOLUTION: A film deposition apparatus 1 comprises: a chamber 10; a first cathode unit 4 having a first target 2 including a film deposition material and forming a film of the film deposition material on a substrate 6 by sputtering inside the chamber; and a second cathode unit 14 having a second cylindrical target 12 including the getter m...