Japan, April 22 -- RESONAC HOLDINGS CORP has got intellectual property rights for 'ETCHING METHOD USING HALOGEN FLUORIDE AND METHOD FOR MANUFACTURING SEMICONDUCTOR.' Other related details are as follows:

Application Number: JP,2024-109842

Category (FI): H01L21/302,105@A,H10P50/20,105@A,H10P50/24,H10P50/28,H10P50/20,101@B,H10P50/20,101@C,H10P50/20,101@D,H01L21/302,101@C,H01L21/302,101@D,H01L21/302,101@B

Stage: Grant (IP right granted following substantive examination.)

Filing Date: July 8, 2024

Publication Date: Oct. 2, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

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