Japan Intellectual Property Rights: DRY DEVELOPMENT PROCESS OF PHOTORESIST

Japan, July 6 -- APPLIED MATERIALS INC has got intellectual property rights for 'DRY DEVELOPMENT PROCESS OF PHOTORESIST.' Other related details are as follows:

Application Number: JP,2024-165091

Category (FI): H01L21/302,101@Z,G03F7/004,G03F7/004,531,H10P50/20,100,H10P50/20,101@Z,H10P76/00,569@H,G03F7/26,H01L21/30,569@H

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Sept. 24, 2024

Publication Date: Feb. 4, 2025

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....