Japan Intellectual Property Rights: COMPOUND, RESIN CONTAINING STRUCTURAL UNIT DERIVED THEREFROM, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

Japan, Aug. 12 -- SUMITOMO CHEMICAL CO LTD has got intellectual property rights for 'COMPOUND, RESIN CONTAINING STRUCTURAL UNIT DERIVED THEREFROM, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN.' Other related details are as follows:

Application Number: JP,2022-155113

Category (FI): G03F7/20,521,C07D317/72,C07D319/08,C07D313/10,G03F7/038,601,C08F220/18,G03F7/039,601,G03F7/004,503@A,G03F7/004,501,G03F7/20,501

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Sept. 28, 2022

Publication Date: April 11, 2023

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

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