Japan, Sept. 9 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD.' Other related details are as follows:

Application Number: JP,2023-077818

Category (FI): G03F7/004,501,G03F7/004,503@A,G03F7/20,501,G03F7/20,521,C08F232/00,G03F7/038,601,C09K3/00@K,C07D307/00,C07D327/08,C07D333/76

Stage: Grant (IP right granted following substantive examination.)

Filing Date: May 10, 2023

Publication Date: Nov. 21, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

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