Japan Intellectual Property Rights: CHEMICAL SOLUTION USED FOR CLEANING OR ETCHING RUTHENIUM-CONTAINING LAYER, AND MANUFACTURING METHOD OF RUTHENIUM WIRING

Japan, March 5 -- TOKYO OHKA KOGYO CO LTD has got intellectual property rights for 'CHEMICAL SOLUTION USED FOR CLEANING OR ETCHING RUTHENIUM-CONTAINING LAYER, AND MANUFACTURING METHOD OF RUTHENIUM WIRING.' Other related details are as follows:

Application Number: JP,2024-219689

Category (FI): H01L21/308@F,H10P50/66,C23F1/30

Stage: PROBLEM TO BE SOLVED: To provide a chemical solution used for cleaning or etching a ruthenium-containing layer, capable of obtaining a ruthenium-containing layer with reduced surface roughness while maintaining a good etching rate for ruthenium, and a manufacturing method of a ruthenium wiring using the chemical solution.SOLUTION: A chemical solution is used for cleaning or etching a ruthenium-containing layer ...