Japan Intellectual Property Rights: CHEMICAL MECHANICAL POLISHING COMPOSITION, RINSE COMPOSITION, CHEMICAL MECHANICAL POLISHING METHOD, AND RINSING METHOD

Japan, May 13 -- JAPAN CABOT MICROELECTRONICS CORP has got intellectual property rights for 'CHEMICAL MECHANICAL POLISHING COMPOSITION, RINSE COMPOSITION, CHEMICAL MECHANICAL POLISHING METHOD, AND RINSING METHOD.' Other related details are as follows:

Application Number: JP,2019-112143

Category (FI): H10P52/40,H10P52/00@H,H01L21/304,622@Q,H01L21/304,622@D,B24B55/06,B24B37/00@H,C09G1/02,C09K3/14,550@Z,H10P52/00@T

Stage: Grant (IP right granted following substantive examination.)

Filing Date: June 17, 2019

Publication Date: Dec. 24, 2020

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....