Japan, Feb. 24 -- HITACHI LTD has got intellectual property rights for 'CHARGE PARTICLE BEAM DEVICE AND METHOD FOR MEASURING ELECTRIC RESISTANCE.' Other related details are as follows:
Application Number: JP,2023-031156
Category (FI): H10P74/00@E,H10P74/00@C,H01L21/66@E,H01L21/66@C,H01J37/28@B,H01J37/22,502@H
Stage: PROBLEM TO BE SOLVED: To provide a charge particle beam device which allows rapid and reliable acquisition of the electric resistance of a sample.SOLUTION: The present invention relates to a charge particle beam device for measuring the electric resistance of a sample 105 having a laminate structure in at least a part of the sample, the laminate structure being formed of an upper layer conductor 201 and a lower layer conducto...