Japan Intellectual Property Rights: CARBON-BASED DEPOSITS USED FOR CRITICAL DIMENSION CONTROL AND FORMATION OF PROTECTIVE LAYERS DURING ETCHING OF HIGH ASPECT RATIO FEATURES

Japan, July 9 -- LAM RESEARCH CORPORATION has got intellectual property rights for 'CARBON-BASED DEPOSITS USED FOR CRITICAL DIMENSION CONTROL AND FORMATION OF PROTECTIVE LAYERS DURING ETCHING OF HIGH ASPECT RATIO FEATURES.' Other related details are as follows:

Application Number: JP,2024-229585

Category (FI): H10P50/28,H10P50/24,H10P50/20,105@A,H01L21/31@C,H10P14/60,101@C,H01L21/302,105@A

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Dec. 26, 2024

Publication Date: April 10, 2025

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

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