Japan Intellectual Property Rights: ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE

Japan, July 31 -- FUJIFILM CORP has got intellectual property rights for 'ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE.' Other related details are as follows:

Application Number: JP,2023-059568

Category (FI): C08F212/14,G03F7/004,501,C08F220/28,G03F7/039,601,G03F7/20,521,G03F7/20,501,G03F7/004,503@A

Stage: Grant (IP right granted following substantive examination.)

Filing Date: March 31, 2023

Publication Date: Oct. 15, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

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