MUMBAI, India, Aug. 12 -- Intellectual Property India has published a patent application (202637048555 A) filed by Wes Tec Global Co. , Ltd. on April 16, 2026, for System And Method For Forming Retaining Wall Block From Recycled Waste Plastic.
Inventors include Choi, Kyoung Young; Choi, Hyun Seok; and Choi, A Yeon.
The application for the patent was published on August 07, 2026, under issue no. 32/2026.
Abstract: The present invention relates to a system for forming a retaining wall block from recycled waste plastic and a method for forming a retaining wall block from recycled waste plastic, and provides the effects of saving time and effort for washing and classifying impurities, which are foreign substances mixed with waste plastic, an...