Intellectual Property India Publishes Patent Application for Substrate Processing Method, Semiconductor Device Production Method, Substrate Processing Device, And Program

MUMBAI, India, Sept. 22 -- Intellectual Property India has published a patent application (202647102019 A) filed by Kokusai Electric Corporation on August 24, 2026, for Substrate Processing Method, Semiconductor Device Production Method, Substrate Processing Device, And Program.

Inventors include Suyama Nagisa; Koide Hiroyuki; and Tanaka Shota.

The application for the patent was published on September 18, 2026, under issue no. 38/2026.

Abstract: The present invention includes a step (a) for performing, a prescribed number of times, a cycle that includes a step (a1) for supplying, under a prescribed condition, a first gas to a substrate having a recess on a surface thereof and forming a first substance containing a first element on the su...