MUMBAI, India, Aug. 31 -- Intellectual Property India has published a patent application (202617081698 A) filed by Cxmt Corporation on July 02, 2026, for Stepped Structure And Manufacturing Method Therefor, And Semiconductor Structure.

Inventor includes Wang, Hong.

The application for the patent was published on August 28, 2026, under issue no. 35/2026.

Abstract: A stepped structure and a manufacturing method therefor, and a semiconductor structure. The stepped structure comprises: a plurality of conductive layers arranged at intervals in a first direction, each conductive layer comprising at least two sub-conductive layers arranged at intervals in a second direction, and the conductive layers extending in a third direction; and a plural...