Intellectual Property India Publishes Patent Application for Silicon–carbon Composite Anode Material Comprising Porous Silicon And Defect-Rich Graphitic Matrix

MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202631062882 A) filed by Cellark Powertech Private Limited on May 18, 2026, for Silicon–carbon Composite Anode Material Comprising Porous Silicon And Defect-Rich Graphitic Matrix.

Inventors include Pandey, Ashwani Kumar; Jena, Somen Sagar; Samantaray, Bikash Kumar; and Pati, Soobhankar.

The application for the patent was published on October 30, 2026, under issue no. 44/2026.

Abstract: A synthesis process combining mechanical embedding and carbon coating for the synthesis of a high-performance sustainable Si–C anode material. The process utilises porous silicon possessing interconnected open nanopores, which help accommodate silicon volume expansion ...