Intellectual Property India Publishes Patent Application for Rotor Lamination Profile Optimization For Maximum Reluctance Torque And Improved Thermal Behavior

MUMBAI, India, July 13 -- Intellectual Property India has published a patent application (202441040513 A) filed by Eicher Motors Limited on May 24, 2024, for Rotor Lamination Profile Optimization For Maximum Reluctance Torque And Improved Thermal Behavior.

Inventors include Ramkumar Mani; and Ranjani Padmanabhan.

The application for the patent was published on July 10, 2026, under issue no. 28/2026.

Abstract: ABSTRACT ROTOR LAMINATION PROFILE OPTIMIZATION FOR MAXIMUM RELUCTANCE TORQUE AND IMPROVED THERMAL BEHAVIOR The present invention provides a rotor lamination profile for a permanent magnet synchronous machine (PMSM) comprising at least one rotor stack including a plurality of laminated magnetic sheets, configured to reduce eddy curre...