MUMBAI, India, June 30 -- Intellectual Property India has published a patent application (202617056465 A) filed by Allnex Usa Inc. on May 04, 2026, for Resin Composition With Reduced Formaldehyde Emission.
Inventors include Froehlich, Gerd; Choueiri, Christine; Nguyen, Vy Ha Thuy; and Addis, Misganaw Berhanu.
The application for the patent was published on June 26, 2026, under issue no. 26/2026.
Abstract: A resin composition comprising an alkylated amino resin which is the reaction product of an amino compound, formaldehyde and an alcohol, wherein the resin composition is obtained by subjecting the alkylated amino resin to a thermal treatment under reduced pressure, thereby reducing the total content of methylol groups in the alkylated a...