MUMBAI, India, June 30 -- Intellectual Property India has published a patent application (202617068648 A) filed by Shine Technologies, LLC on June 01, 2026, for Reduced Form Factor Plasma Windows Positioned In A Beam Accelerator System.
Inventors include Barrows, Preston; and Blatz, Joshua.
The application for the patent was published on June 26, 2026, under issue no. 26/2026.
Abstract: A beam accelerator system comprises: a beamline comprising a low-pressure chamber and an ion accelerator configured to generate an ion beam; a target chamber; and a plasma window assembly interposed between and fluidly connecting the beamline and the target chamber. The plasma window assembly comprises an anode and a plurality of cooling plates. Each cool...