MUMBAI, India, Sept. 7 -- Intellectual Property India has published a patent application (202617085033 A) filed by Chemetall Gmbh on July 10, 2026, for Pretreatment Of Galvanized Metallic Substrates With Aluminum Oxide Hydroxide Containing Rinsing Solutions.
Inventors include Krausse, Nico; Kasper, Christoph; Hoffmann-Loeser, Petra Andrea; Kolberg, Thomas; Dong, Xu; and Ehlscheid, Tobias Christian.
The application for the patent was published on September 04, 2026, under issue no. 36/2026.
Abstract: The invention relates to a method of pretreating an at least partially galvanized metallic substrate, by cleaning steps with one or more aqueous cleaning compositions; followed by rinsing steps, with one or more aqueous rinsing compositions A...