MUMBAI, India, Sept. 28 -- Intellectual Property India has published a patent application (202647105152 A) filed by Toray Industries, Inc. on September 01, 2026, for Porous Structure And Method For Producing Porous Structure.
Inventors include Shimura Shun; Akioka Ippei; and Miki Taiga.
The application for the patent was published on September 25, 2026, under issue no. 39/2026.
Abstract: The purpose of the present invention is to provide a porous structure that has high transparency and that contains a polyamide polymer, which is a fluorine-free compound, as the main component. This porous structure is composed of linked spherical bodies that have a polyamide polymer as the main component.
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