MUMBAI, India, July 7 -- Intellectual Property India has published a patent application (202647077239 A) filed by Novamont S. P. A. on June 23, 2026, for Polymer Composition For Films With Polyether-Polyol Plasticisation System.
Inventors include D'Elicio, Alessandro; Milizia, Tiziana; Russo, Claudio; and Gesti Garcia, Sebasti.
The application for the patent was published on July 03, 2026, under issue no. 27/2026.
Abstract: A polymer composition comprising an aliphatic-aromatic polyester with a high starch or starch derivative content and an improved linear or branched polyether-polyol plasticisation system, particularly suitable for use in the manufacture of films that can be used in the production of products such as waste bags, shoppi...