MUMBAI, India, July 30 -- Intellectual Property India has published a patent application (202411088545 A) filed by Indian Institute Of Technology Jodhpur on November 15, 2024, for Plasma Plume Signal Based Closed-Loop Control System And Method For Laser-Based Direct Energy Deposition Processes.
Inventors include Dr. Ravi K R; and Mohit Singh.
The application for the patent was published on July 24, 2026, under issue no. 30/2026.
Abstract: The present disclosure relates to a plasma plume-based closed-loop control system (100) and method for regulating a direct energy deposition (DED) process in additive manufacturing. The method utilizes real-time optical emission spectrometry (OES) to monitor plasma plume intensity and dynamically adjust...