Intellectual Property India Publishes Patent Application for Photomask-Free Laser-Induced Spatiotemporal Patterning Of Supramolecular Hydrogels Through Catalytic In Situ Hydrogelator Generation

MUMBAI, India, Aug. 10 -- Intellectual Property India has published a patent application (202641089401 A) filed by Vellore Institute Of Technology on July 22, 2026, for Photomask-Free Laser-Induced Spatiotemporal Patterning Of Supramolecular Hydrogels Through Catalytic In Situ Hydrogelator Generation.

Inventors include Chandan Maity; and Divya Lalbahadur Chauhan.

The application for the patent was published on July 31, 2026, under issue no. 31/2026.

Abstract: ABSTRACT The present invention relates to a photomask-free method for spatiotemporal patterning of supramolecular hydrogels through laser-induced catalytic in situ generation of low-molecular-weight hydrogelators. A precursor composition comprising a protected coumarin aldehyde prec...