MUMBAI, India, June 22 -- Intellectual Property India has published a patent application (202641070643 A) filed by Indian Institute Of Science on June 05, 2026, for Patterned Porous Elastomer Film For A Sensor Device.
Inventors include Sanjiv Sambandan; and Chithra Parameswaran.
The application for the patent was published on June 12, 2026, under issue no. 24/2026.
Abstract: ABSTRACT PATTERNED POROUS ELASTOMER FILM FOR A SENSOR DEVICE The present disclosure relates to methods and system for obtaining a patterned porous elastomer film, which may be used for manufacturing sensor arrays or electronics substrates. The method employs a first porous elastomer film formed by curing a first elastomer precursor comprising a curable elastomer resi...