MUMBAI, India, July 13 -- Intellectual Property India has published a patent application (202617074034 A) filed by Powall Holding B. V.; and Nederlandse Organisatie Voor Toegepast- on June 15, 2026, for Particulate Composite Iridium Oxide Materials And Preparation Method And Application Thereof.
Inventors include Van Dijk, Bas; and Ruszin, Aaron.
The application for the patent was published on July 10, 2026, under issue no. 28/2026.
Abstract: The present application discloses a method for producing an iridium oxide film on a particulate substrate having an electrical conductivity of 0.01 S/cm (as detected by powder measurements) by chemical vapour deposition, comprising: (i) providing the particulate substrate in a reaction chamber; (ii)...