MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202617098206 A) filed by Solstice Advanced Materials Us, Inc. on August 13, 2026, for Molybdenum Sputtering Target With High Transverse Rupture Strength.
Inventors include Wu, Xiaodan; Strothers, Susan D.; and Mohanty, Rashmi.
The application for the patent was published on October 30, 2026, under issue no. 44/2026.
Abstract: A molybdenum sputtering target assembly includes molybdenum sputtering target diffusion bonded directly to a molybdenum backing plate. The molybdenum sputtering target consists of molybdenum and the molybdenum backing plate consists of molybdenum or a molybdenum alloy.
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