MUMBAI, India, July 13 -- Intellectual Property India has published a patent application (202647083418 A) filed by Asml Netherlands B. V. on July 07, 2026, for Method Of Scanning A Sample With Non-Circular Beam Spots.
Inventors include Zhou, Yongjian; Gong, Zizhou; Ji, Xiaoyu; and Ren, Weiming Number.
The application for the patent was published on July 10, 2026, under issue no. 28/2026.
Abstract: Systems, methods, and non-transitory computer readable mediums for scanning a sample with non-circular beam spots may include generating an elongated electron beam; orientating the elongated electron beam such that a length of the elongated electron beam is parallel to an edge of a pattern on the sample; scanning the pattern with the elongated ...