Intellectual Property India Publishes Patent Application for Method Of Processing Substrate, Method Of Manufacturing Semiconductor Device, And Substrate Processing Apparatus

MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202644047309 A) filed by Kokusai Electric Corporation on April 13, 2026, for Method Of Processing Substrate, Method Of Manufacturing Semiconductor Device, And Substrate Processing Apparatus.

Inventors include Yoma Yamane; Kiyohisa Ishibashi; Shingo Nohara; and Kento Suzuki -.

The application for the patent was published on October 30, 2026, under issue no. 44/2026.

Abstract: METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SUBSTRATE PROCESSING APPARATUS There is provided a technique that includes (a) performing: (a1) storing a process gas obtained by phase-changing a substance in a liquid or solid phase in a reservoir...