Intellectual Property India Publishes Patent Application for Method Of Making An Amorphous Carbon-Coated Electrode Material

MUMBAI, India, Oct. 5 -- Intellectual Property India has published a patent application (202521030177 A) filed by Epsilon Advanced Materials Pvt. Ltd. on March 28, 2025, for Method Of Making An Amorphous Carbon-Coated Electrode Material.

Inventors include Chinnasamy Natarajan; and Rongali Hareesh.

The application for the patent was published on October 02, 2026, under issue no. 40/2026.

Abstract: Abstract A method of making an electrode material is described. The method includes the steps of obtaining (102) a particulate carbonaceous material, shaping (104) particles of the particulate carbonaceous material to reduce jagged edges of the particulate carbonaceous material to obtain a shaped carbonaceous material, mixing (106) carbonaceous ...