MUMBAI, India, Oct. 26 -- Intellectual Property India has published a patent application (202617091630 A) filed by Reeverse Systems on July 28, 2026, for Method For Classifying Projected Longitudinal Offcuts In An Industrial Manufacturing Process, And Associated System.
Inventors include Molle, Sandrine; and Rainer-Alexander, Jeremy.
The application for the patent was published on October 23, 2026, under issue no. 43/2026.
Abstract: The invention relates to a method for processing offcuts in an industrial manufacturing process, the method comprising: ? acquiring (ACQ1) a first schedule (PL1); ? acquiring (ACQ2) a first optimization plan (POA); ? characterizing (CAR1) at least one projected offcut (CHk) defining at least one zone of the o...