MUMBAI, India, July 31 -- Intellectual Property India has published a patent application (202647086900 A) filed by Asml Netherlands B. V. on July 16, 2026, for Method And Apparatus For Assessing A Sample Surface, Method Of Scanning A Sample Surface, And Charged Particle Assessment Apparatus.

Inventor includes Maassen, Martinus, Gerardus, Johannes, Maria.

The application for the patent was published on July 24, 2026, under issue no. 30/2026.

Abstract: The present disclosure provides methods and apparatus relating to assessing a sample surface using charged particles. In one arrangement, a method comprises, at a first region of a sample surface on which is an intended pattern, relative scanning a beam over an elongate row portion of the in...