Intellectual Property India Publishes Patent Application for Materials, Processes, And Methods For The Adsorption Of Harmful Compounds

MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202617095293 A) filed by Piac Gmbh on August 06, 2026, for Materials, Processes, And Methods For The Adsorption Of Harmful Compounds.

Inventors include Gottschall, Evelyn; and Gottschall, Klaus.

The application for the patent was published on October 30, 2026, under issue no. 44/2026.

Abstract: The invention relates to a polymeric mesh comprising a cross-linked polymer, wherein the cross-linked polymer comprises residues of a polyvalent carboxylic acid, a polyvalent amine, and a cross-linker. The polymeric mesh may be used for removing harmful compounds from an environment such as a gas or an aqueous environment.

Disclaimer: Curated by HT Syndicatio...