Intellectual Property India Publishes Patent Application for Material For Forming X-Ray Structure Analysis Sample, And Method For Determining Molecular Structure Of Organic Compound Using Same

MUMBAI, India, June 24 -- Intellectual Property India has published a patent application (202617061932 A) filed by The University Of Tokyo; and Daicel Corporation on May 15, 2026, for Material For Forming X-Ray Structure Analysis Sample, And Method For Determining Molecular Structure Of Organic Compound Using Same.

Inventors include Sato, Sota; Fujita, Makoto; and Gondo, Keisuke.

The application for the patent was published on June 12, 2026, under issue no. 24/2026.

Abstract: Provided is a novel material for forming an X-ray structure analysis sample of an organic compound. A material for forming an X-ray structure analysis sample according to the present disclosure contains the metal complex crystal described below. Metal complex crysta...