MUMBAI, India, July 24 -- Intellectual Property India has published a patent application (202647086516 A) filed by Koken Ltd. on July 15, 2026, for Mask.
Inventors include Sato Akihiro; and Sugita Haruka.
The application for the patent was published on July 17, 2026, under issue no. 29/2026.
Abstract: [Problem] To provide a mask capable of maintaining a comfortable fit as much as possible. [Solution] A mask 1 comprises a mask body part 2 and a face-contact body 3. The mask body part 2 is provided with a shape retainer 6 for retaining a three-dimensional structure during wear, the shape retainer 6 comprising: a shape-retainer-side central portion 60a that covers the central part in the left- right direction of the face of a wearer 100 alo...