MUMBAI, India, July 7 -- Intellectual Property India has published a patent application (202647078998 A) filed by Asml Netherlands B. V. on June 26, 2026, for Laser Powered Plasma Based Euv Generation System.
Inventors include Van Der Hoeven, Saartje, Willemijn; Ganguly, Vasishta, Parthasarathy; Scaccabarozzi, Luigi; Hagenaars, Hubertus, Luberta; Chowdhury, Yassin; and Waiboer, Robert Rens Number.
The application for the patent was published on July 03, 2026, under issue no. 27/2026.
Abstract: A laser powered plasma, LPP, based EUV generation system is configured to generate EUV light by irradiating droplets of a target material with at least one laser beam. The system comprises a metrology module configured to determine a position of a ...