MUMBAI, India, July 13 -- Intellectual Property India has published a patent application (202617075208 A) filed by Fujifilm Corporation; and Fujifilm Electronic Materials U. S. A. , Inc. on June 17, 2026, for Kit And Method For Manufacturing Semiconductor Device.
Inventors include Kamimura Tetsuya; Mizutani Atsushi; Hu Bin; Liang Yannan Number; Sugimura Nobuaki; Huang Ting-Kai; Fan Hanyu; Li Wei; and Lee Hyosang.
The application for the patent was published on July 10, 2026, under issue no. 28/2026.
Abstract: Provided are a kit including a polishing liquid and a washing liquid and a method for manufacturing a semiconductor device using the kit. The kit, when used for a treatment in which a treatment target is subjected to chemical mechan...