MUMBAI, India, Aug. 24 -- Intellectual Property India has published a patent application (202621080967 A) filed by Symbiosis International Deemed University on June 30, 2026, for Integrated Ai-Driven Embroidery Learning And Creation Platform With Diy Kit.
Inventors include Nisreen Huzefa; Dr. Neetu Singh; and Shailaja Bhagwat.
The application for the patent was published on August 21, 2026, under issue no. 34/2026.
Abstract: ABSTRACT INTEGRATED AI-DRIVEN EMBROIDERY LEARNING AND CREATION PLATFORM WITH DIY KIT The present invention discloses an integrated AI-driven embroidery learning and creation platform (100) combining curated physical DIY embroidery kits (200) with an intelligent web-based digital interface (110). The platform (100) fe...