MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202617094093 A) filed by Shanghai Lianfeng Gas Co. , Ltd on August 04, 2026, for Hydrofluoric Acid Regeneration Method For Photovoltaic Waste Acid.
Inventors include Jiang, Xiaoping; Zhang, Zhengxiong; Hao, Wenbing; Wei, Chuxiu; and Yu, Qingbo.
The application for the patent was published on October 30, 2026, under issue no. 44/2026.
Abstract: Disclosed in the present application is a hydrofluoric acid regeneration method for photovoltaic waste acid. The method comprises the following steps: S1, light component removal, involving: introducing a liquid containing hydrofluoric acid to be treated into a light component removal tower, wherein the tower b...