MUMBAI, India, Aug. 12 -- Intellectual Property India has published a patent application (202647093192 A) filed by Mitsubishi Heavy Industries, Ltd. on July 31, 2026, for Gas Treatment Facility And Gas Treatment Facility Method.
Inventors include Katsuki Masatoshi; Onuki Takuro; and Mukai Yosuke.
The application for the patent was published on August 07, 2026, under issue no. 32/2026.
Abstract: This gas treatment facility comprises: a dust collection filter device; and a reactant supply machine that can supply, into gas to be recovered, a reactant capable of reacting with the gas while in powder form. The dust collection filter device is provided with: a case in which there are formed an inlet through which gas flows in and an outlet thr...