Intellectual Property India Publishes Patent Application for Gas Excitation Apparatus, Vacuum Arrangement, Method, And Use Of A Plasma Source

MUMBAI, India, Sept. 14 -- Intellectual Property India has published a patent application (202617063760 A) filed by Von Ardenne Asset Gmbh & Co. Kg on May 20, 2026, for Gas Excitation Apparatus, Vacuum Arrangement, Method, And Use Of A Plasma Source.

Inventors include Milde, Falk; and Faber, Jrg.

The application for the patent was published on September 11, 2026, under issue no. 37/2026.

Abstract: According to various embodiments, a gas excitation apparatus (100) comprises: a plasma zone (152); a gas-conducting system (110) designed to conduct a gas stream through the plasma zone (152); and an inductive plasma source (112) designed to excite the formation of plasma in the plasma zone (152).

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