MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202647106821 A) filed by Yanyang New Energy Suzhou Co. , Ltd. on September 04, 2026, for Full-Aperture Stencil And Printing Device.
Inventors include Hu, Bingfeng; and Zhang, Qiong.
The application for the patent was published on October 30, 2026, under issue no. 44/2026.
Abstract: A full-aperture stencil and a printing device. The full-aperture stencil comprises a stencil main body (110), the stencil main body (110) is formed with a full-aperture pattern for single-pass printing of fine-fingers and busbars or connecting lines connected to the fine fingers, wherein the full-aperture pattern comprises a plurality of main lines (1) extending in a first...