MUMBAI, India, Sept. 14 -- Intellectual Property India has published a patent application (202641106120 A) filed by Sri Eshwar College Of Engineering on September 03, 2026, for Dual-Network Passive Flow Control Device With Pressure-Redistribution Chamber For Enhanced Directional Flow Resistance.
Inventors include Dr. Y. Sureshbabu; and Rohith R.
The application for the patent was published on September 11, 2026, under issue no. 37/2026.
Abstract: The present invention relates to a dual-network passive flow control device with a pressure-redistribution chamber for enhanced directional flow resistance, configured to control fluid movement through fixed internal geometry without requiring movable mechanical components, external actuation or...