MUMBAI, India, Oct. 26 -- Intellectual Property India has published a patent application (202611115293 A) filed by Chandigarh University on September 25, 2026, for Distributed Epistemic Observation And Autonomous Correction System For Precision Manufacturing.
Inventors include Priyansh Sharma; Akshit Chaudhary; Akshat Tanwar; and Swati Sharma.
The application for the patent was published on October 23, 2026, under issue no. 43/2026.
Abstract: A distributed precision-manufacturing control system performs operation-level observation, epistemic validation and autonomous correction. A multimodal sensing module acquires time-associated process signals during an active manufacturing operation. A local unit forms an observed state, while an exp...