MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202617094847 A) filed by Nissan Chemical Corporation on August 05, 2026, for Composition For Forming Resist Underlayer Film.
Inventors include Itaoka Kohei; Ogata Hiroto; and Tamura Mamoru.
The application for the patent was published on October 30, 2026, under issue no. 44/2026.
Abstract: A composition for forming a resist underlayer film contains: a polymer (A) containing a phenolic hydroxy group and a nitro group; and a solvent (B).
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