MUMBAI, India, July 7 -- Intellectual Property India has published a patent application (202617067433 A) filed by Nissan Chemical Corporation on May 29, 2026, for Composition For Forming Resist Underlayer Film.
Inventors include Igata Kosuke; and Tamura Mamoru.
The application for the patent was published on July 03, 2026, under issue no. 27/2026.
Abstract: This composition for forming a resist underlayer film contains a solvent and a resin (A) having a ring structure and a polymerizable multiple bond group. The ring structure is at least one selected from the group consisting of aromatic rings having 6-26 carbon atoms and non-aromatic rings having 6-10 carbon atoms. The polymerizable multiple bond group has at least one selected from th...