MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202617097991 A) filed by Nissan Chemical Corporation on August 13, 2026, for Composition For Forming Coating Film For Foreign Substance Removal And Semiconductor Substrate.
Inventors include Kamibayashi Satoshi; Moriya Shunsuke; and Kishioka Takahiro.
The application for the patent was published on October 30, 2026, under issue no. 44/2026.
Abstract: A composition for forming a coating film for foreign substance removal, said composition containing a water-soluble compound and a solvent, and being capable of forming a coating film that can be removed by water.
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